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1 lithographic patterning
Универсальный англо-русский словарь > lithographic patterning
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2 lithographic patterning
микр. формирование рисунка методом литографииEnglish-Russian electronics dictionary > lithographic patterning
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3 lithographic patterning
микр. формирование рисунка методом литографииThe New English-Russian Dictionary of Radio-electronics > lithographic patterning
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4 patterning
1) формирование структуры; структурирование; придание (определённой) конфигурации; размещение или расположение по (определённой) схеме2) создание узора; образование узора; формирование (структурированного) рисунка3) тлв муар4) распределение; картина распределения; диаграмма распределения5) формирование диаграммы направленности (напр. антенны)6) следование модели или образцу, изготовление по шаблону7) следование стилю; придание формы•- lithographic patterning -
5 patterning
1) формирование структуры; структурирование; придание (определённой) конфигурации; размещение или расположение по (определённой) схеме2) создание узора; образование узора; формирование (структурированного) рисунка3) тлв. муар4) распределение; картина распределения; диаграмма распределения5) формирование диаграммы направленности (напр. антенны)6) следование модели или образцу, изготовление по шаблону7) следование стилю; придание формы•- lithographic patterningThe New English-Russian Dictionary of Radio-electronics > patterning
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6 нанесение рисунка литографским способом
Makarov: lithographic patterningУниверсальный русско-английский словарь > нанесение рисунка литографским способом
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7 технология литографии
lithographic [lithography] technique, pattern-defining [patterning] technique, lithographic technologyБольшой англо-русский и русско-английский словарь > технология литографии
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8 технология литографии
lithographic [lithography\] technique, pattern-defining [patterning\] technique, lithographic technologyАнгло-русский словарь технических терминов > технология литографии
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9 технология литографии
lithographic [lithography] technique, pattern-defining [patterning] technique, lithographic technologyРусско-английский политехнический словарь > технология литографии
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10 метод литографии
lithographic [lithography] technique, pattern-defining [patterning] techniqueБольшой англо-русский и русско-английский словарь > метод литографии
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11 метод литографии
lithographic [lithography\] technique, pattern-defining [patterning\] techniqueАнгло-русский словарь технических терминов > метод литографии
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12 метод литографии
lithographic [lithography] technique, pattern-defining [patterning] techniqueРусско-английский политехнический словарь > метод литографии
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13 метод литографии
1) Engineering: lithographic technique, lithography technique, litography technique, pattern-defining technique, patterning technique2) Electronics: lithographic method, planographic method3) Microelectronics: lithographic technology, resist technique -
14 технология литографии
1) Engineering: lithographic technique, lithographic technology, litography technique, pattern-defining technique, patterning technique2) Makarov: lithography techniqueУниверсальный русско-английский словарь > технология литографии
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15 process
1. ім.1) процес; (технологічний) метод, спосіб2) технологія (див. т-ж technique, technology)3) (технологічна) обробка; технологічна операція2. дієсл. обробляти; проводити технологічну операцію - all-ion-implant process
- all-planar process
- Auger process
- batch process
- BH bias and hardness process
- BH process
- bonding process
- BOX process
- bulk CMOS process
- bumping process
- chip-on-board process
- closed CMOS process
- CMOS-on-sapphire process
- composite сеll logic process
- contact process
- conventional process
- deep охide isolation process
- DIFET process
- diffused eutectic aluminum process
- direct synthesis and crystal pull process
- double-diffused process
- double ion-implanted process
- double-layer polysilicon gate MOS process
- double-layer polysilicon gate process
- epitaxial deposition process
- epitaxial process
- epitaxial growth process
- flip-over process
- floating-gate silicon process
- front-end process
- gold-doped process
- guard-banded CMOS process
- heterogeneous process
- high-voltage process
- HMOS process
- imaging process
- implantation process
- in-house process
- interconnection process
- inverted meniscus process
- ion plating process
- isoplanar -S, -Z, -2 process
- isoplanar process
- junction-isolated process
- laser-recrystallized process
- lithographic process
- low-pressure process
- low VT process
- lost wafer process
- major process
- masking process
- master slice process
- mesa-isolation process
- metal-gate MOS process
- metal-gate process
- microbipolar LSI process
- micrometer-dimension process
- mid-film process
- Minimod process
- Mo-gate MOS process
- Mo-gate process
- nitride process
- nitrideless process
- NSA process
- oxide-film isolation process
- oxide isolated process
- oxygen refilling process
- patterning process
- phosphorous buried-emitter process
- photoablative process
- photolithography process
- photoresist process
- planar oxidation process
- Planox process
- plasma etch process
- Poly I process
- Poly II process
- Poly 5 process
- poly-oxide process
- Poly-Si process
- polysilicon-gate process
- poly-squared MOS process
- proprietary process
- PSA bipolar process
- PSA process
- refractory metal MOS process
- refractory metal process
- sacrificial охide process
- sapphire dielectric isolation process
- scaled Poly 5 process
- screen-and-fire process
- selective field-охidation process
- self-aligned gate process
- self-aligned process
- self-registered gate process
- self-registered process
- semi-additive process
- semiconductor-thermoplastic-dielectric process
- semicustom process
- shadow masking process
- silk-screen process
- single poly process
- SMOS process
- SOS/CMOS process
- stacked fuse bipolar process
- Stalicide process
- step-and-repeat process
- subtractive-fabrication process
- surface process
- Telemos process
- thermal process
- thermally асtivated surface process
- thermal-охidation process
- three-mask process
- triple-diffused process
- triply-poly process
- twin-tub process
- twin-well process
- V-groove MOS process
- V-groove process
- wet process
- 3-D process
См. также в других словарях:
Patterning by etching at the nanoscale — (PENs) is a soft lithographic technique in which the bonds in the PDMS matrix are broken to controlably etch PDMS (ie dissolve) at a slow rate along the outside of a PDMS channel formed with a patterned PDMS stamp applied to a surface. The… … Wikipedia
Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of … Wikipedia
Double patterning — is a class of technologies developed for photolithography to enhance the feature density. For the semiconductor industry, double patterning is the only lithography technique to be used for the 32 nm and 22 nm half pitch nodes in 2008 2009 and… … Wikipedia
Lithography — Charles Marion Russell s The Custer Fight (1903). Note the range of tones, fading toward the edges … Wikipedia
nanotechnology — /nan euh tek nol euh jee, nay neuh /, n. any technology on the scale of nanometers. [1987] * * * Manipulation of atoms, molecules, and materials to form structures on the scale of nanometres (billionths of a metre). These nanostructures typically … Universalium
45 nanometer — Per the [http://www.itrs.net/reports.html International Technology Roadmap for Semiconductors] , the 45 nm technology node should refer to the average half pitch of a memory cell manufactured at around the 2007 2008 time frame.Matsushita and… … Wikipedia
Interference lithography — (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. Basic principleThe basic principle is the same as in interferometry or holography. An… … Wikipedia
Depth of field — The area within the depth of field appears sharp, while the areas in front of and beyond the depth of field appear blurry … Wikipedia
National Institute of Standards and Technology — NIST redirects here. For other uses, see NIST (disambiguation). National Institute of Standards and Technology Agency overview Headquarters Gaithersburg, Maryland … Wikipedia
Patch antenna — A patch antenna is a popular antenna type, which gains its name from the fact that it basically consists of a metal patch suspended over a ground plane. The assembly is usually contained in a plastic radome, which protects the structure from… … Wikipedia
Salicide — The term salicide refers to a technology used in the microelectronics industry used to form electrical contacts between the semiconductor device and the supporting interconnect structure. The salicide process involves the reaction of a thin metal … Wikipedia
